Fully equipped cleanroom for microfabrication: electronic device, thin film coating, surface patterning.
High flexibiliy and customization
Maximum wafer diameter: 6”
Cleanroom space rental
In our cleanroom complex microstructures can be realized.
We provide photolithographic process, thin film deposition and dry/wet etching.
We perform the whole process (from silicon wafer to device) or single technological step.
Any need will be processed with the most appropriate technique
Deposition methods
Coatings
Substrate
We customizes surface micro- and nano- patterning for different application
e.g. superhydrophobicity, self-cleaning, antifog, antimicrobial, biosensing…
We will find the best strategy to get the required morphology effects:
Aim of the project
We demonstrate the feasibility of a deep through etch for the realization of a sensor for aerospace applications.
Challenges
Results
DRIE (Deep Reactive Ion Etching) process have been calibrated especially for this application.
Aim of the project
We demonstrate the feasibility of a deep through etch for the realization of a sensor for aerospace applications.
Challenges
Results
DRIE (Deep Reactive Ion Etching) process have been calibrated especially for this application.
Piazza Solferino, 20
10121 Torino
P.I. 09922510012